Proton beam writing nanoprobe facility design and first test results
نویسندگان
چکیده
A second generation proton beamwriting line has been installed at the Centre for Ion BeamApplications at the National University of Singapore. This system features a high demagnification lens system based on compact OM52 lenses with reduced working distance. The system can operate in a variety of high demagnification configurations, including the spaced Oxford triplet and the double-crossover Russian quadruplet. It features an electrostatic scanning system and a new collimator slit aperture design. Here we present the first results with this system operating in a spaced Oxford triplet configuration with a beam focus in one direction down to 20 nm.One of the limitations of the current system is the inferior quality of the high-voltage supply driving the electrostatic scanning system. The second focus of this paper is the performance of the new collimator slit aperture design for MeV nanoprobe forming systems. Cylindrically strained electroplated Ni surfaces with a bending radius of 50 mmare used as slit edges. An incidentmolecular beamof 2 MeVH2 + ionswas used for the slit scatteringmeasurements.Any scatteringby the slits resulting indissociationof the incidentmolecularbeam into 1MeVprotons facilitated themeasurements of scattered andnon-scattered components by the passivated implantedplanar silicon (PIPS)detector. The studies showed theexpectedcorrelationbetween theaperture size and scattering. The quality of the beamwas satisfactory even for small aperture dimensions with a very small percentage of the beam showing energy loss. & 2010 Elsevier B.V. All rights reserved.
منابع مشابه
Orthogonal and fine lithographic structures attained from the next generation proton beam writing facility
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تاریخ انتشار 2011